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Patterned deposition at moving contact line
Thiele U
Research article (journal)
| Peer reviewed
Details about the publication
Journal:
Advances in Colloid and Interface Science
Volume:
206
Page range:
1-45
Status:
Published
Release year:
2014
Language in which the publication is written:
English
DOI:
10.1016/j.cis.2013.11.002
Authors from the University of Münster
Thiele
,
Uwe
Professur für Theoretische Physik (Prof. Thiele)
Center for Data Science and Complexity (CDSC)
Center for Multiscale Theory and Computation
(CMTC)