Dynamical model for chemically driven running droplets.

Thiele U, John K, Bär M

Sonstige wissenschaftliche Veröffentlichung

Zusammenfassung

We propose coupled evolution equations for the thickness of a liquid film and the density of an adsorbate layer on a partially wetting solid substrate. Therein, running droplets are studied assuming a chemical reaction underneath the droplets that induces a wettability gradient on the substrate and provides the driving force for droplet motion. Two different regimes for moving droplets--reaction-limited and saturated regime--are described. They correspond to increasing and decreasing velocities with increasing reaction rates and droplet sizes, respectively. The existence of the two regimes offers a natural explanation of prior experimental observations.

Details zur Publikation

StatusVeröffentlicht
Veröffentlichungsjahr2004 (09.07.2004)
Sprache, in der die Publikation verfasst istEnglisch
DOI10.1103/PhysRevLett.93.027802

Autor*innen der Universität Münster

Thiele, Uwe
Professur für Theoretische Physik (Prof. Thiele)